Wednesday, June 18, 2025

EVG Debuts LITHOSCALE XT for Heterogeneous Integration

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LITHOSCALE XT provides up to five-fold increase in throughput versus previous industry benchmark LITHOSCALE system; EVG maskless exposure technology to be highlighted at ECTC 2025

EV Group (EVG), a leading provider of innovative process solutions and expertise serving leading-edge and future semiconductor designs and chip integration schemes, introduced the LITHOSCALE® XT maskless exposure (MLE™) system, the industry’s first true high-throughput/high-resolution digital lithography solution for high-volume-manufacturing (HVM) heterogeneous integration applications.

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